Collaborative Simulation Grid Portal
An Advanced Research and Development Environment System for the Development of
Next Generation Semiconductor Production Technology
Accelerates Practical Implementation of Next Generation Semiconductor Production Technology,
Aimed at Ultra-Large-Scale IT Integration |
June 2, 2005-NEC System Technologies, Ltd. and NEC Corporation together announced today "Collaborative Simulation Grid Portal (hereinafter referred to as "EUV Grid") in collaboration with the Institute of Laser Engineering in Osaka University. This system is for the research and development of laser-plasma extreme ultraviolet (EUV) sources that the Institute will use for research and development of next generation semiconductor production. EUV Grid allows multiple research organizations to execute research activities in parallel, thereby significantly reducing the software development period. It also enables simulation conducted by linking programs that are developed by different research institutions.
More achievements are expected for practical uses of EUV Grid for the production of next generation semiconductors that will require ultra-large-scale integration.
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